Advances in resist technology and processing XXII (San Jose CA, 28 February - 2 March 2005)Sturtevant, John L.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, XLIII, 1216 p, isbn 0-8194-5733-7Conference Proceedings

Advances in resist technology and processing XXI (Santa Clara CA, 23-24 February 2004)Sturtevant, John L.SPIE proceedings series. 2004, isbn 0-8194-5289-0, 2Vol, XVI, 1288 p, isbn 0-8194-5289-0Conference Proceedings

Lithographic technologies that haven't (yet) made it; lessons learnedPEASE, R. Fabian.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, xxxiii-xliiiConference Paper

Full-chip lithography simulation and design analysis : How OPC is changing IC designSPENCE, Chris.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, xix-xxxiiConference Paper

Dissolution behavior of resist polymers studied using quartz crystal microbalance methodTORIUMI, Minoru.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 302-308Conference Paper

The Evolution of Patterning Process Models in Computational LithographySTURTEVANT, John L.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763902.1-763902.13, 2Conference Paper

Effect of film composition on the performance of interdigitated electrode methods used for chemically amplified photoresist characterization : Methods for analyzing photoresist materials containing base quencherBERGER, Cody; HENDERSON, Clifford L.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 1076-1087Conference Paper

Basic aspects of acid generation processes in chemically amplified resists for electron beam lithographyKOZAWA, Takahiro; TAGAWA, Seiichi.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 361-367Conference Paper

Mechanism study of defect improvement by short develop time processTAMADA, Osamu; SANADA, Masakazu.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 996-1007Conference Paper

Impregnation of resist with functional molecules using supercritical fluid : A new approach to resist engineering for advanced lithographyNAMATSU, Hideo; SATO, Mitsuru.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 1, 187-194Conference Paper

Throughput increase by adjustment of the BARC drying time with coat track processBRAKENSIEK, Nickolas L; LONG, Ryan.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 1102-1107Conference Paper

Optimizing gate layer OPC correction and SRAF placement for maximum design manufacturabilityBRIST, Travis; LE HONG; YEHIA, Ayman et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211L.1-65211L.10, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Towards full- chip prediction of yield- limiting contact patterning failure : Correlation of simulated image parameters to advanced contact metrology metricsSTURTEVANT, John L; CHOU, Dyiann.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6195-4, 2Vol, vol 1, 615209.1-615209.11Conference Paper

The development of an I-line attenuated phase shift process for dual inlay interconnect lithographySTURTEVANT, John L; HO, Benjamin C. P; GEISZLER, Vincent C et al.SPIE proceedings series. 2000, pp 505-512, isbn 0-8194-3617-8Conference Paper

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; SHINDO, Hiroyuki; HOJYO, Yutaka et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81661S.1-81661S.9, 2Conference Paper

Towards the Prediction of Pattern Collapse Hotspots for FullChip LayoutsSTURTEVANT, John L; DAVE, Aasutosh; HOLLERBACH, Uwe et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8166, issn 0277-786X, isbn 978-0-8194-8791-9, 81663Y.1-81663Y.8, 2Conference Paper

Process Variability Band Analysis for Quantitative Optimization of Exposure ConditionsSTURTEVANT, John L; JAYARAM, Srividya; LE HONG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72751Q.1-72751Q.6Conference Paper

Experimental determination of the impact of polysilicon LER on sub-100 nm transistor performancePATTERSON, Kyle; STURTEVANT, John L; ALVIS, John et al.SPIE proceedings series. 2001, pp 809-814, isbn 0-8194-4030-2Conference Paper

Impact of Illumination on Model -Based SRAF Placement for Contact PatterningSTURTEVANT, John L; JAYARAM, Srividya; EL-SEWEFY, Omar et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764036.1-764036.6, 2Conference Paper

Contour Oualitv Assessment for OPC Model CalibrationFILITCHKIN, Paul; DO, Thuy; KUSNADI, Ir et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72722Q.1-72722Q.7, 2Conference Paper

SEM-contour based OPC model calibration through the process windowVASEK, Jim; MENEDEVA, Ovadya; LEVITZKY, Dan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65180D.1-65180D.10, issn 0277-786X, isbn 978-0-8194-6637-2Conference Paper

The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-Contours from wafer and maskHIBINO, Daisuke; HOJYO, Yutaka; SHINDO, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7971, issn 0277-786X, isbn 978-0-8194-8530-4, 79712G.1-79712G.9, 2Conference Paper

High-precision contouring from SEM image in 32-nm lithography and beyondSHINDO, Hiroyuki; SUGIYAMA, Akiyuki; VAN DE KERKHOVE, Jeroen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72751F.1-72751F.9Conference Paper

Impact of Illumination Source Symmetrization in OPCSTURTEVANT, John L; LE HONG; JAYARAM, Srividya et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70283M.1-70283M.10, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Automatic Assist Feature Placement Optimization Based On Process-Variability ReductionJAYARAM, Srividya; YEHIA, Ayman; BAHNAS, Mohamed et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67302E.1-67302E.9, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper